Imec, ASML demonstrate potential of 193nm immersion lithography with freeform illumination
Imec and ASML collaborated to qualify ASML's Tachyon Source Mask Optimization and programmable illuminator system FlexRay, proving its potential with the demonstration of a 22nm SRAM memory cell.
Imec, ASML demonstrate potential of 193nm immersion lithography with freeform illumination
Imec and ASML collaborated to qualify ASML's Tachyon Source Mask Optimization and programmable illuminator system FlexRay, proving its potential with the demonstration of a 22nm SRAM memory ...
Wed 14 Jul 10 from PhysOrg
Imec and ASML Qualifies ASML's Tachyon and FlexRay
Imec and ASML collaborated to qualify ASML’s Tachyon Source Mask Optimization and programmable illuminator system FlexRay™, proving its potential with the demonstration of a 22nm ...
Tue 13 Jul 10 from AZoNano
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