Six More Companies Join Design for E-Beam Initiative
SAN JOSE, Calif., Feb. 23 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced its new design for e-beam (DFEB) mask technology for the production of advanced optical photomasks with circular and curvilinear shapes.
Six More Companies Join Design for E-Beam Initiative
The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that six additional companies ...
Wed 24 Feb 10 from R&D Mag
New Semiconductor Companies Join eBeam Initiative to Support New DFEB Mask Roadmap, Wed 24 Feb 10 from AZoNano
D2S Introduces New DFEB Mask Technology for Advanced Optical Photomasks Manufacturing
D2S™, an emerging design and software company, today announced its new design for e-beam (DFEB) mask technology for the production of advanced optical photomasks with circular and curvil...
Wed 24 Feb 10 from AZoNano
D2S Redefines Mask Rules for the 22-nm and Smaller Technology Nodes
SAN JOSE, Calif., Feb. 23 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced its new design for e-beam (DFEB) mask technology for the production of advanced optical ...
Tue 23 Feb 10 from RedOrbit
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